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1

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Reliability of contrast and dissolution-rate-derived parameters as predictors of photoresist performance

Spragg, Peggy M., Hurditch, Rodney J., Toukhy, Medhat A., Helbert, John N., Malhotra, Sandeep, Ito, Hiroshi

Année:

1991

Langue:

english

Fichier:

PDF, 1.08 MB

english, 1991

2

Radiation degradation susceptibility of vinyl polymers: Nitriles and anhydrides

John N. Helbert, Edward H. Poindexter, Glenn A. Stahl, Chi-Yu Chen, Charles U. Pittman Jr.

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Année:

1979

Langue:

english

Fichier:

PDF, 532 KB

english, 1979

3

Increased radiation degradation in methyl methacrylate copolymers

John N. Helbert, Burkhard E. Wagner, Philip J. Caplan, Edward H. Poindexter

Journal:

Journal of Applied Polymer Science

Année:

1975

Langue:

english

Fichier:

PDF, 199 KB

english, 1975

4

Radiation degradation of α-substituted acrylate polymers and copolymers

John N. Helbert, Philip J. Caplan, Edward H. Poindexter

Journal:

Journal of Applied Polymer Science

Année:

1977

Langue:

english

Fichier:

PDF, 576 KB

english, 1977

5

Gamma-ray degradation of 1,1-disubstituted vinyl copolymers

Chi-Yu Chen, Mohammad Igbal, Charles U. Pittman Jr., John N. Helbert

Journal:

Macromolecular Chemistry and Physics

Année:

1978

Langue:

english

Fichier:

PDF, 338 KB

english, 1978

6

Gamma-ray degradation of 1,1-disubstituted vinyl copolymers

Chi-Yu Chen, Mohammad Igbal, Charles U. Pittman Jr., John N. Helbert

Journal:

Macromolecular Chemistry and Physics

Année:

1978

Fichier:

PDF, 30 KB

1978

7

Scalar dynamic nuclear polarization of protons in trifluoroacetic acid solutions

John N. Helbert, Edward H. Poindexter, Burkhard E. Wagner

Journal:

Chemical Physics Letters

Année:

1977

Langue:

english

Fichier:

PDF, 286 KB

english, 1977

8

Radiation degradation behavior of chlorine-containing vinyl copolymers. Search for improved electron-beam resists

John N. Helbert, Edward H. Poindexter, Charles U. Pittman Jr., Chi-Yu Chen

Journal:

Polymer Engineering & Science

Année:

1980

Langue:

english

Fichier:

PDF, 679 KB

english, 1980

9

Radiation-degradation susceptibility studies of vinyl terpolymers: Search for improved electron beam resists

Easley Wallace Jr., Chi-Yu Chen, Charles U. Pittman Jr., Joe H. Kwiatkowski, Charles F. Cook Jr., John N. Helbert

Journal:

Polymer Engineering & Science

Année:

1985

Langue:

english

Fichier:

PDF, 816 KB

english, 1985

10

Matrix ENDOR of polyenyl radicals in polymers

John N. Helbert, Burkhard E. Wagner, Edward H. Poindexter, Larry Kevan

Journal:

Journal of Polymer Science Part B: Polymer Physics

Année:

1975

Langue:

english

Fichier:

PDF, 470 KB

english, 1975

11

Radiation degradation of methyl α-chloroacrylate–methacrylonitrile copolymers

Chi-Yu Chen, Charles U. Pittman Jr., John N. Helbert

Journal:

Journal of Polymer Science Part A: Polymer Chemistry

Année:

1980

Langue:

english

Fichier:

PDF, 533 KB

english, 1980

12

Transvenous dual site left ventricular pacing plus biventricular pacing for the management of refractory ventricular tachycardia

Helbert Acosta, Vijayasimha R. Pothula, John Arter, Cindy Antonio, Sumati Ramadas, Agustin Castellanos

Journal:

Journal of Interventional Cardiac Electrophysiology

Année:

2006

Langue:

english

Fichier:

PDF, 137 KB

english, 2006

13

Environment of the iron-sulfur chromophore in adrenodoxin studied by EPR and ENDOR spectroscopy

Kazuo Mukai, Tokuji Kimura, John Helbert, Larry Kevan

Journal:

Biochimica et Biophysica Acta (BBA) - Protein Structure

Année:

1973

Langue:

english

Fichier:

PDF, 497 KB

english, 1973

14

Paramagnetic defects in silicon/silicon dioxide systems

Philip J. Caplan, John N. Helbert, Burkhard E. Wagner, Edward H. Poindexter

Journal:

Surface Science

Année:

1976

Langue:

english

Fichier:

PDF, 656 KB

english, 1976

15

Characterization of silica surfaces by free radical spin labels

Burkhard E Wagner, John N Helbert, Edward H Poindexter, Richard D Bates Jr.

Journal:

Surface Science

Année:

1977

Langue:

english

Fichier:

PDF, 1.14 MB

english, 1977

16

Comparison of methodological data measurement limits in CD4 + T lymphocyte flow cytometric enumeration and their clinical impact on HIV management

Whitby, Liam, Whitby, Alison, Fletcher, Matthew, Helbert, Matthew, Reilly, John T., Barnett, David

Journal:

Cytometry Part B: Clinical Cytometry

Année:

2013

Langue:

english

Fichier:

PDF, 218 KB

english, 2013

17

Komatiites as Mercury surface analogues: Spectral measurements at PEL

Maturilli, Alessandro, Helbert, Jörn, St. John, James M., Head, James W., Vaughan, William M., D'Amore, Mario, Gottschalk, Matthias, Ferrari, Sabrina

Journal:

Earth and Planetary Science Letters

Année:

2014

Langue:

english

Fichier:

PDF, 2.31 MB

english, 2014

18

Complexing and protonation of free-radical imidazolin-1-oxyl and imidazolin-1-oxyl 3-oxide ligands: a magnetic-resonance investigation

Helbert, John N., Kopf, Peter W., Poindexter, Edward H., Wagner, Burkhard E.

Journal:

Journal of the Chemical Society Dalton Transactions

Année:

1975

Langue:

english

Fichier:

PDF, 1.14 MB

english, 1975

19

Spin density delocalization from a stable free-radical ligand onto diamagnetic metal ions

Wagner, Burkhard E., Helbert, John N., Bates, Richard D., Poindexter, Edward H.

Journal:

Journal of the Chemical Society Chemical Communications

Année:

1973

Langue:

english

Fichier:

PDF, 141 KB

english, 1973

20

Matrix ENDOR Linewidths of Trapped Electrons in Glassy Matrices at 77°K

Journal:

The Journal of Chemical Physics

Année:

1972

Langue:

english

Fichier:

PDF, 701 KB

english, 1972

21

ENDOR of trapped hydrogen atoms in gamma-irradiated glassy acid matrices and in polycrystalline oxyanion matrices

Journal:

The Journal of Chemical Physics

Année:

1973

Langue:

english

Fichier:

PDF, 802 KB

english, 1973

22

Application of silanes for promoting resist patterning layer adhesion in semiconductor manufacturing

Helbert, John N., Saha, Naresh

Journal:

Journal of Adhesion Science and Technology

Année:

1991

Langue:

english

Fichier:

PDF, 4.86 MB

english, 1991

23

Electron Beam and X-Ray Resist Behavior of Poly(methacrylonitrile)

Helbert, John N.

Journal:

Journal of The Electrochemical Society

Année:

1979

Langue:

english

Fichier:

PDF, 608 KB

english, 1979

24

Electron paramagnetic resonance and electron-nuclear double resonance line shape studies of trapped electrons in .gamma.-irradiated deuterium-substituted 10 M sodium hydroxide alkaline ice glass

Bales, Barney L., Helbert, John, Kevan, Larry

Journal:

Journal of Physical Chemistry

Année:

1974

Langue:

english

Fichier:

PDF, 1.12 MB

english, 1974

25

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Optical/Laser Microlithography II - Lithographic Process Development for High Numerical Aperture I-Line Steppers

Waldo, Whitson G., Helbert, John N., Lin, Burn J.

Année:

1989

Langue:

english

Fichier:

PDF, 4.60 MB

english, 1989

26

SPIE Proceedings [SPIE Micro92 - San Jose, CA (Monday 9 March 1992)] Optical/Laser Microlithography V - Lithographic impact of thin film effects on advanced BIMOS semiconductor device layer structures

Lee, Fourmun, Malhotra, Sandeep, Louis, Victor, Helbert, John N., Cuthbert, John D.

Année:

1992

Langue:

english

Fichier:

PDF, 307 KB

english, 1992

27

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Production metrology and control of color filter array photolithography for CMOS imagers

Yanof, Arnold W., Daou, A., Annand, James P., Pantel, M., Drowley, Cliff I., Helbert, John N., Ygartua, Carlos L., Hayzelden, Clive, Singh, Bhanwar

Année:

1999

Langue:

english

Fichier:

PDF, 681 KB

english, 1999

28

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Improving metrology signal-to-noise on grainy overlay features

Yanof, Arnold W., Windsor, Woody, Elias, Russ, Helbert, John N., Harker, Cameron, Jones, Susan K.

Année:

1997

Langue:

english

Fichier:

PDF, 890 KB

english, 1997

29

Increased platelet reactivity as measured by plasma glycoprotein VI in gout

Conway, Richard, Murphy, Claire-Louise, Madigan, Anne, Kavanagh, Patricia, Geraghty, Liz, Redmond, Niamh, Helbert, Laura, Carey, John J., Dunne, Eimear, Kenny, Dermot, McCarthy, Geraldine M.

Journal:

Année:

2017

Langue:

english

Fichier:

PDF, 707 KB

english, 2017

30

ChemInform Abstract: ELECTRON PARAMAGNETIC RESONANCE AND ELECTRON-NUCLEAR DOUBLE RESONANCE LINE SHAPE STUDIES OF TRAPPED ELECTRONS IN GAMMA-IRRADIATED DEUTERIUM-SUBSTITUTED 10M SODIUM HYDROXIDE ALKALINE ICE GLASS

BALES, BARNEY L., HELBERT, JOHN, KEVAN, LARRY

Journal:

Chemischer Informationsdienst

Année:

1974

Fichier:

PDF, 135 KB

1974

31

ChemInform Abstract: COMPLEXING AND PROTONATION OF FREE-RADICAL IMIDAZOLIN-1-OXYL AND IMIDAZOLIN-1-OXYL 3-OXIDE LIGANDS, A MAGNETIC-RESONANCE INVESTIGATION

HELBERT, JOHN N., KOPF, PETER W., POINDEXTER, EDWARD H., WAGNER, BURKHARD E.

Journal:

Chemischer Informationsdienst

Année:

1975

Fichier:

PDF, 211 KB

1975

32

Soluble glycoprotein VI, a specific marker of platelet activation is increased in the plasma of subjects with seropositive rheumatoid arthritis

Stack, John R., Madigan, Anne, Helbert, Laura, Dunne, Eimear, Gardiner, Elizabeth E., Andrews, Robert K., Finan, Roisin, Smyth, Elizabeth, Kenny, Dermot, McCarthy, Geraldine M., Ahrens, Ingo

Journal:

Année:

2017

Langue:

english

Fichier:

PDF, 815 KB

english, 2017

33

The Quantitative Influence of Agitation on Yeast Growth during Fermentation

Rice, James F., Helbert, J. Raymond, Garver, John C.

Journal:

Proceedings. Annual meeting - American Society of Brewing Chemists

Année:

1975

Langue:

english

Fichier:

PDF, 436 KB

english, 1975

34

Handbook of VLSI Microlithography || Resist Technology—Design, Processing, and Applications

Helbert, John N.

Année:

2001

Langue:

english

Fichier:

PDF, 4.33 MB

english, 2001

35

Inhibition of Beer Volatiles Formation by Carbon Dioxide Pressure

Rice, James F., Chicoye, Etzer, Helbert, J. Raymond, Garver, John

Journal:

Journal of the American Society of Brewing Chemists

Année:

1977

Langue:

english

Fichier:

PDF, 368 KB

english, 1977

36

The Quantitative Influence of Agitation on Yeast Growth during Fermentation

Rice, James F., Helbert, J. Raymond, Garver, John C.

Journal:

Proceedings. Annual meeting - American Society of Brewing Chemists

Année:

1974

Langue:

english

Fichier:

PDF, 457 KB

english, 1974